MPCVD Reactor
MPCVD Reactor
Microwave Plasma Chemical Vapour Deposition (MPCVD) reactors work on the principle of growing homo- and hetero-epitaxial single-crystal diamonds or polycrystalline diamonds on various substrates using a gaseous carbon precursor aided by microwave plasma discharge. In the interest of growing uniform and defect-free diamonds, the reactor performance stability is expected for couple hundred hours.
- Reliable And Efficient Chamber Made Out Of Stainless Steel To Prevent Degassing And Contamination.
- Convenient Design For Effortless Cleaning And Maintenance.
- High-precision water-cooled Z-axis moving stage.
- Vacuum Leakage Rate Of The Order Of 10-10 Torr-ltr/sec.
- Zero Leakage Of Microwave Radiations Throughout The Deposition Process.
- Stability Throughout A Wide Range Of Operating Pressure (20 to 500 Torr).
- Complete Automated Control And Surveillance Over All Growth Parameters In Real Run-Time.
- High Plasma Stability Over A Broad Range Of Pressure And Power.
- Uniform Temperature Profile Throughout The Deposition Area with a Minute Variation Of Within ±2.5%.
- Growth Area Of 60 and 75 mm Diameter for 6 and 10 kW reactors, respectively.
- Turbo Molecular Pump-based MPCVD Reactors Are Available For The Deposition Of Ultra-pure SCDs.
Our MPCVD Reactor Is Available In 6 kW And 10 kW Variants. The Reactors Are Equipped With Dual-Stage Rotary Vane Pump That Can Generate A Vacuum Of <5 X 10-3 Torr, And Optionally Can Be Used Along With Turbo Molecular Pump To Achieve An Ultimate Vacuum Of 10-6 Torr.
Our MPCVD Reactor Is Available In 6 kW And 12 kW Variants. The Reactors Are Equipped With Dual-Stage Rotary Vane Pump That Can Generate A Vacuum Of <5 X 10-3 Torr, And Optionally Can Be Used Along With Turbo Molecular Pump To Achieve An Ultimate Vacuum Of 10-6 Torr.
Microwave Plasma Chemical Vapour Deposition (MPCVD) reactors work on the principle of growing homo- and hetero-epitaxial single-crystal diamonds or polycrystalline diamonds on various substrates using a gaseous carbon precursor aided by microwave plasma discharge. In the interest of growing uniform and defect-free diamonds, the reactor performance stability is expected for couple hundred hours.
- Reliable And Efficient Chamber Made Out Of Stainless Steel To Prevent Degassing And Contamination.
- Convenient Design For Effortless Cleaning And Maintenance.
- High-precision water-cooled Z-axis moving stage.
- Vacuum Leakage Rate Of The Order Of 10-10 Torr-ltr/sec.
- Zero Leakage Of Microwave Radiations Throughout The Deposition Process.
- Stability Throughout A Wide Range Of Operating Pressure (20 to 500 Torr).
- Complete Automated Control And Surveillance Over All Growth Parameters In Real Run-Time.
- High Plasma Stability Over A Broad Range Of Pressure And Power.
- Uniform Temperature Profile Throughout The Deposition Area with a Minute Variation Of Within ±2.5%.
- Growth Area Of 60 and 75 mm Diameter for 6 and 10 kW reactors, respectively.
- Turbo Molecular Pump-based MPCVD Reactors Are Available For The Deposition Of Ultra-pure SCDs.
Our MPCVD Reactor Is Available In 6 kW And 10 kW Variants. The Reactors Are Equipped With Dual-Stage Rotary Vane Pump That Can Generate A Vacuum Of <5 X 10-3 Torr, And Optionally Can Be Used Along With Turbo Molecular Pump To Achieve An Ultimate Vacuum Of 10-6 Torr.
